Draw MEMS Process Steps Through Matlab

A small matlab program has been wroten to assist the layout of MEMS process. Normally, MEMS processes include deposit, LIGA (lithography), and etching. This program is based on this concept as well. By just simply write the deposit, LIGA, and etching commands, with their parameters, the MEMS cross section layout can be drawn after any step. The commands include:

• loadlayerprofile() -- which stores all the preference parameters which can be altered at will.
  

• deposit ('materailName', thickness) -- materialName currently support Si, SiO2, PR, metal. thickness shoulb between 1 and 10.
  
• liga (pattern) -- pattern is an char array like ' --- -- - ---', the length is variable, while the blank means etched photo resistor.
• etch ('materialName') -- currently support anisotropic etching only.
• removepr() -- remove all the PR current on the surface.
  
• drawlayers() -- can be put after any command above. This command draw the current cross section view.

Example:
clear all;
clear global;
loadlayerprofile('MEMS');

figure(1);
deposit ('Si', 10);
deposit('SiO2', 1);
drawlayers();

deposit('Si', 6);
deposit('PR', 1);
drawlayers();
liga(' - ---- - ');
etch ('Si');
removepr('PR');
drawlayers();

deposit('metal', 2);
deposit('PR', 1);
liga(' -- ');
etch ('metal');
removepr('PR');
drawlayers();

deposit('PR', 1);
liga('-- -------------- --');
drawlayers();
etch ('SiO2');
drawlayers();
etch ('Si');
removepr('PR');
drawlayers();
axis ([0 100 0 120])


RESULT: